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Prall K. CMOS Plasma and Process Damage 2025
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| Uploader: | andryold1 | ||||||||||||||||||||||||
| Source: |
The Pirate Bay
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| Description: |
Textbook in PDF format
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems
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| Category: | Books | ||||||||||||||||||||||||
| Size: | 74.3 MB | ||||||||||||||||||||||||
| Added: | June 10, 2025, 7:36 p.m. | ||||||||||||||||||||||||
| Peers: | Seeders: 36, Leechers: 32 (Last updated: 10 months ago) | ||||||||||||||||||||||||
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